For more information, contact:
Advanced Energy Industries, Inc.
Brochure Describes the only RF Power Measurement Package Designed for Plasma-Based Processes
FORT COLLINS, Colorado (May 31, 1996)
—Advanced Energy Industries, Inc. (AE) announces the only RF power measurement instrumentation
package designed for the plasma-based thin film process environment—the advanced GenCal system. The GenCal system provides industry-leading measurement accuracy at the discrete frequencies commonly used in the plasma process industry.
- Minimum effect of amplitude modulation (AM)
- Not effected by harmonics
- ± 1% accuracy
For a free copy of the brochure describing the advanced GenCal™ system (AE #5600045), contact AE at the address and phone number given above.
Founded in 1980, AE is a leading supplier of power conversion and control systems for plasma-based thin film production equipment. Our systems are critical to industrial processes that use gaseous plasmas to deposit or etch thin film layers on materials or substrates such as glass, silicon, and metals during the manufacture of semiconductors, data storage media, flat panel displays, and a host of other products.