For more information, contact:

Tom Grove
Advanced Energy Industries, Inc.
(970) 224-6313

Advanced Energy Announces the HFG Series of 2500 and 5000 W, 4 MHz CE-Certified Power Supplies

FORT COLLINS, Colorado (November 7, 1997)—Advanced Energy Industries, Inc.’s new HFG 2501 and HFG 5000 4 MHz power supplies use AE's patented, field-proven RF circuit topology to deliver up to 2500 W and 5000 W, respectively, into 50-W, non-reactive loads. Plasma process tool applications for the HFG series include plasma etch and deposition, reactive ion etch, RF sputtering, RF bias, and other related plasma processes. The reliable HFGs regulate on forward power and delivered power; are certified by CE, UL/CSA, and GS; and are SEMI S2-compliant.


Designed for applications requiring 1% regulation accuracy, the HFG series offers control flexibility through a 25-pin parallel User port. The compact HFG 2501 can be mounted directly to your tool. The HFG 5000 is mountable into a standard 19-inch rack, with a 5.25-inch panel height. The HFG water-cooled design effectively eliminates fans and large heat sink hardware, allowing you to reduce overall system size while cooling more efficiently. Water-control solenoids are available for both HFGs. These thermally controlled solenoids conserve water and prevent condensation buildup in systems with low water temperatures. Both HFGs use 3 f, 208 Vac, 50/60 Hz power sources and are tolerant of arbitrary phase rotation of the input power connections.

  • Compliant with CE, UL/CSA, GS, and SEMI S2
  • Power densities of ±5 W per cubic inch with superior repeatability, stability, and linearity
  • Bulkhead-mounted ac connector for easy installation and maximum wiring flexibility
  • Front indicators: AC On, RF On, Overtemperature, Power Limit, and Interlock Open

For a free copy of literature describing the new HFGs, contact AE at the address, phone number, or website given above.

Founded in 1981, AE is a leading supplier of power conversion and control systems for plasma-based thin film production equipment. Our systems are critical to industrial processes that use gaseous plasmas to deposit or etch thin film layers on materials or substrates such as glass, silicon, and metals during the manufacture of semiconductors, data storage media, flat panel displays, and a host of other products.