For more information, contact:

Tom Grove
Advanced Energy Industries, Inc.

AE Introduces the Next Generation Low-Frequency Power Supply for 40 kHz Reactive Sputtering

FORT COLLINS, Colorado (March 25, 1998)—Advanced Energy Industries, Inc. (AE) announces the next generation low-frequency power supply with enhanced arc control and internal load matching for 40 kHz reactive sputtering applications—the advanced PEII. The PEII series offers outputs of up to 60 kW—with no external combining hardware such as transformers.


The compact PEII offers two distinct arc-handling circuits as well as an automatic process safeguard to ensure maximum power output to the process and enables you to work through a fault condition.

The PEII series has dual floating outputs that can be grounded on either side. It has a water-cooled design and offers tight output regulation on power, voltage, or current with a measurement accuracy of 1% and low harmonics, which ensure equal performance across all power levels. All PEIIs are PLC (programmable logic controller) compatible and are designed to meet CE specifications.


  • High power density
  • Wide tap range
  • Regulation on power, voltage, or current
  • Enhanced arc control
  • Flexible modularity
  • Automatic process safeguard

For a free copy of the brochure describing the advanced PEII series (AE 561001), contact AE at the above address, phone number, or website.

Founded in 1981, AE is a leading supplier of power conversion and control systems for plasma-based thin film production equipment. Our systems are critical to industrial processes that use gaseous plasmas to deposit or etch thin film layers on materials or substrates such as glass, silicon, and metals during the manufacture of semiconductors, data storage media, flat panel displays, and a host of other products.