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Advanced Energy Industries, Inc.
Thermoelectric Temperature Control Literature For Advanced Etch Now Available From Noah Precision
San Jose, California (November 8, 2000)—
A new series of literature describing thermoelectric temperature control for advanced semiconductor etch applications is now available from Noah Precision, an Advanced Energy Industries, Inc. company (NASDAQ NM: AEIS). Noah's point-of-use (POU) systems provide superior dynamic temperature control for the wafer chuck and chamber walls. Noah's broad product line also includes systems that can also provide many process advantages for wet etch and track applications.
- Precise temperature control in real time
- No temperature drift
- Compact design
- Small footprint
- High reliability
- Solid-state operation with only one moving part
- Process flexibility
- Low power usage
- High tool up-time
- Environmentally friendly operation