ADVANCED ENERGY NEWS—2003
5. Dezember - Advanced Energy Announces Departure of Chief Operating Officer

11. November - AE Senior Scientist Dr. William D. Sproul receives American Vacuum Socitey’s Prestigious John A. Thornton Memorial Award

16. Oktober  - AE Reports Third Quarter 2003 Results

16. September - Advanced Energy's Aera® Mass Flow Controller Selected For Poly Etch Systems By Leading Chip Maker

5. August - Advanced Energy’s Apex® Integrated Power Delivery System Named Default Standard on PECVD Systems by Leading Semiconductor Equipment Maker

24. Juli - AE Reports Second Quarter 2003 Results

14. Juli - AE Showcases Xstream™ Remote Plasma Source at SEMICON West

3. Juli - Advanced Energy Names Michael D. Smith General Manager Of Customer Operations, China

24. Juni - Advanced Energy Names Donsung (Robert) Kim President of Advanced Energy Korea

17. Juni - One Of Advanced Energy’s Senior Scientist Receives Mentor Award From SVC

10. Juni - Advanced Energy Receives ISO 9001:2000 Certification By Fulfilling ISO’s New Compliance Requirements

3. Juni - Advanced Energy Rolls Out Xstream™ Remote Plasma Source With Active Matching Network™

15. Mai - Advanced Energy Responds to MKS Instruments Lawsuit

17. April - AE Reports First Quarter 2003 Results


8. April - Unaxis Qualifies AE’s Pinnacle® Diamond DC-Power Source for New Data-Storage Platform

26. März - AE Launches Euro-Centric Web Site

13. Februar - AE Reports Fourth Quarter 2002 Results

10. Februar - Advanced Energy Names Dennis Faerber Chief Operating Officer
 

16. Januar - AE's Aera® MFCs Named Default Standard on CVD Systems