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Advanced Energy Unveils Litmas™ RPS 1501 Remote Plasma Source
FORT COLLINS, Colo., June 22, 2004
—Advanced Energy Industries, Inc. (Nasdaq: AEIS) today unveiled its next-generation Litmas™ RPS 1501 linear-inductive remote plasma source for advanced thin-film processes. Especially well-suited for wafer pre-clean, photoresist strip, gate dielectric deposition and atomic layer deposition (ALD) applications, the Litmas RPS 1501 also facilitates the development of a wide variety of other advanced process applications. Specifically, its plug-and-play installation, uniquely wide matching range and small footprint reduce time-to-market for new chamber development.