For more information, contact:

Marna Shillman
Advanced Energy Industries, Inc.
Angie Kellen

Advanced Energy to Debut Ovation™ Power Delivery System and Litmas™ RPS Remote Plasma Source for Advanced Processes at SEMICON® WEST 2004

AE to also showcase Aera® Transformer™ multi-gas, multi-range digital MFC and Xstream™ remote plasma source with Active Matching Network™


FORT COLLINS, Colo., July 7, 2004—Advanced Energy Industries, Inc. (Nasdaq: AEIS) today announced that it will debut two products during SEMICON® West—the Ovation™ very-high frequency (VHF) power delivery system and the Litmas™ RPS remote plasma source for advanced thin-film processes. AE also will feature its new Aera® Transformer™ multi-gas, multi-range (MGMR) digital mass flow controller (MFC) series and the Xstream™ remote plasma source with Active Matching Network™ at the exposition, to be held July 12-14 at the Moscone Center in San Francisco. The newest offerings from AE enable advanced, semiconductor manufacturing process technologies that OEMs and end users require to provide their customers with highly differentiated solutions.

New Ovation™ Very-High Frequency (VHF) Power Delivery System
The newest addition to AE’s industry-leading power portfolio, this fully-integrated, power delivery system enables faster, higher-precision processes, such as those required for demanding narrow-linewidth, dielectric etch processes through implementation of a unique power delivery scheme. It is the first to accurately deliver power into a non-50-ohm environment without an external sensor, reacting faster than traditional power supplies. The 60-MHz design reduces voltage potential across the plasma sheath, minimizing ion etch damage, thus improving film quality and yields. Its embedded measurement technology enables previously unavailable insight into chamber plasma parameters and performance.

New Litmas™ RPS 1501 Linear-Inductive, Remote Plasma Source
The Litmas™ RPS is the only fully integrated, remote, inductive plasma source and power delivery system available in a high-conductance, low-surface-area, linear geometry. Well-suited for wafer pre-clean, photoresist strip, gate dielectric deposition and atomic layer deposition (ALD), the Litmas RPS also facilitates other advanced process development. Specifically, its plug-and-play installation, uniquely wide matching range and small footprint reduce time-to-market for new chamber development. The platform’s solid-state power-matching design delivers up to 1.5 kW of stable radio-frequency (RF) power in less than 3 milliseconds, enabling faster changing, sub-90 nm and 300-mm processes. Its extremely low source-to-source variability enhances end-user process development and yields.

Aera® Transformer™ Multi-Gas, Multi-Range Digital MFC
The versatile Transformer™ multi-gas, multi-range (MGMR) MFC platform dramatically reduces spares inventories, which can create a substantially lower total cost of ownership (CoO). This inherently flexible platform provides unmatched field programmability to run any gas for any gas flow range—from 10 sccm to up to 30 slm. As few as eight different Transformer MFC models can support a fab’s requirements. These MFCs allow unlimited gas selection without recalibration, and they can be pulled directly from a customer’s inventory shelf and easily programmed to meet the application requirements.

Xstream™ Remote Plasma Source with Active Matching Network™
The Xstream platform provides unsurpassed flexibility in difficult reactive-gas processes, improving system throughput and optimizing the use of expensive resources. This is accomplished by integrating a remote plasma source, a 8 kW or 6 kW high-efficiency power supply and a patented solid-state active matching network, which accommodates the widest impedance operating range commercially available in a chamber-clean source. The platform generates active, neutral chemical species from stable feed gases for surface modification, chamber cleaning, thin-film etch and plasma-assisted deposition.

About Advanced Energy
Advanced Energy is a global leader in the development and support of technologies critical to high-technology manufacturing processes used in the production of semiconductors, flat panel displays, data storage products, compact discs, digital video discs, architectural glass and other advanced product applications.

Leveraging a diverse product portfolio and technology leadership, AE creates solutions that maximize process impact, improve productivity and lower cost of ownership for its customers. This portfolio includes a comprehensive line of technology solutions in power, flow management, thermal instrumentation and plasma and ion beam sources for original equipment manufacturers (OEMs) and end-users around the world.

AE operates in regional centers in North America, Asia and Europe and offers global sales and support through direct offices, representatives and distributors. Founded in 1981, AE is a publicly held company traded on Nasdaq National Market under the symbol AEIS. More information can be found at

Advanced Energy, AE, Aera, Ovation, Litmas, Transformer, Xstream and Active Matching Network are trademarks of Advanced Energy Industries