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AE to Feature Aera® PI-980™ Series Pressure-Insensitive MFC for Advanced Processes at SEMICON China 2006
SHANGHAI, China, March 14, 2006—Advanced Energy Industries, Inc. (Nasdaq: AEIS) today announced that it will feature its Aera® PI-980™ series pressure-insensitive mass flow controller (MFC) during SEMICON China 2006. The company also will showcase its Navigator™ Digital Matching Network and the Litmas™ RPS 1501 and 3001 remote plasma source platform at the exposition, held March 21-23 at the Shanghai New International Expo Center (SNIEC) in Shanghai, China.
The Aera PI-980 series pressure-insensitive MFC is especially well-suited for etch, CVD, PVD, and diffusion applications, delivering faster response, greater gas-flow stability, higher accuracy, and better real-time process control than previous technologies or competitive products. Specifically, its superior gas-flow stability provides greater chamber-to-chamber process repeatability for improved production yields. The advanced design of the PI-980 integrates traditional thermal flow architecture with a pressure sensor, pressure display, temperature sensor and NeuralStep™ control technology, creating a single delivery package and eliminating the need for the costly gas-panel components traditionally used to perform the same function.
In addition, the Navigator Digital Matching Network will be exhibited at AE’s booth #2326. The Navigator, which is equipped with microprocessor-controlled stepper motor circuitry and digital, user-selectable tuning algorithms, minimizes reflected power by automatically tuning the complex impedance of a coupled plasma. For real-time measurement and analysis of process power and impedance, the optional, internal Z’Scan® RF sensor enables the user to identify and significantly reduce process variability.
Also showcased this year will be AE’s Litmas RPS 1.5 kW and 3 kW integrated plasma source and power-delivery systems. The Litmas RPS is the only fully integrated, remote, inductive plasma source and power delivery system available in a high-conductance, low-surface-area geometry. It is well-suited to deliver reactive gas specie fluxes for process applications such as wafer pre-clean, photoresist strip and thin-film deposition.
To learn more about AE’s products during SEMICON China, March 21-23, visit their booth #2326 in hall W2 at the Shanghai New International Expo Center (SNIEC) in Shanghai, China. Editors interested in meeting with AE during the show may contact Angie Kellen by phone at: (650) 968-8900 x120, or email: firstname.lastname@example.org.
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