For more information, contact:
Visit AE® at SEMICON® China Hall E3, Booth #3539
Advanced Energy® to Feature Litmas™ Remote Plasma Source Platform for Advanced Processes at Semicon® China 2007
AE also showcasing its award-winning Aera® EPV exhaust pressure controller and Navigator® digital matching network
SHANGHAI, China, March 13, 2007—Advanced Energy today announced that it will feature its Litmas™ RPS 1501 and 3001 remote plasma source platform during SEMICON® China 2007. The company also will showcase its Aera® EPV-100AW exhaust pressure controller, Navigator® digital matching network as well as other products at the show held March 21-23 at the Shanghai New International Exhibition Centre (SNIEC) in Shanghai, China.
The Litmas RPS 1.5 kW and 3 kW are integrated plasma source and power-delivery systems. Its small footprint, high performance, ease of use and low cost of ownership allow process engineers to focus on developing critical plasma-based processes with lower device damage, higher throughput and higher yields. AE’s Litmas RPS is well-suited to deliver reactive gas specie fluxes for process applications such as wafer pre-clean, photoresist strip and thin-film deposition.
Also showcased will be AE’s award-winning Aera EPV-100AW exhaust pressure controller. Its patented technology enables user selection of either “absolute” or differential control of a process chamber’s exhaust pressure. The EPV enables precise control of exhaust pressure and, thereby, of oxide film thickness—regardless of atmospheric pressure changes, such as weather conditions, house exhaust-pressure fluctuations or altitude. Due to its superior durability, reliability and reduced power consumption, the EPV enables improved yield and lower cost of ownership.
In addition, in AE’s booth #3539, hall E3, will be the Navigator, which is equipped with microprocessor-controlled stepper motor circuitry and digital, user-selectable tuning algorithms for high-power solar and FPD applications. Its matching network minimizes reflected power by automatically tuning the complex impedance of a coupled plasma. The Navigator digital matching network provides advanced match technology for rapid, accurate and reliable matching across a wide range of load impedances. An optional, internal Z’Scan® RF sensor allows real-time measurement and analysis of process power and impedance, providing the ability to identify and significantly reduce process variability.
To learn more about AE’s products during SEMICON China, March 21-23, visit their booth #3539 in hall E3 at the Shanghai New International Exhibition Centre (SNIEC) in Shanghai, China. Editors interested in meeting with AE during the show may contact Angie Kellen by phone at: 650.968.8900 x120, or email: email@example.com.
About Advanced Energy®
Advanced Energy® develops innovative power and control technologies that drive high-growth, plasma thin-film manufacturing processes worldwide, including semiconductors, flat panel displays, data storage products, solar cells, architectural glass, and other advanced product applications.
AE®’s product portfolio includes precise, flexible power systems; reliable gas and liquid flow-management systems; accurate thermal instruments; and global support services. Leveraging this focused product portfolio and technology leadership, AE creates solutions that maximize process impact, improve productivity, and lower cost of ownership for its customers, including original equipment manufacturers (OEMs) and end-users around the world.
AE operates in regional centers in North America, Asia, and Europe and offers global sales and support through direct offices, representatives, and distributors. Founded in 1981, AE is a publicly held company traded on Nasdaq National Market under the symbol AEIS. For more information, go to www.advanced-energy.com.
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Advanced Energy®, AE®, Aera®, Z’Scan®, Navigator®, and LitmasTM are trademarks of Advanced Energy Industries, Inc.
SEMICON® is a registered trademark of Semiconductor Equipment and Materials International (SEMI).