For more information, contact:

Bates Marshall
Vice President, Sales and Marketing
Advanced Energy Industries, Inc.

Advanced Energy Highlights Enabling Pulsing Technology for 2X/1X Nanometer at SEMICON® Korea 2014
Power Conversion With Multi-Level Pulsing Enables Exceptional Plasma Management for PECVD, PEALD, and Advanced Etch Applications

SEOUL, South Korea, February 12, 2014Advanced Energy Industries, Inc. (NasdaqGM: AEIS) today will highlight its advanced pulsing technology at SEMICON® Korea 2014. The company will showcase its industry-leading single- and multi-level RF pulsing platform, essential for sub 22-nm node migration. The RF product lineup includes 400 kHz to 60 MHz power delivery systems with breakthrough features to improve etch rate selectivity, feature profile control and film thickness uniformity. Advanced digital matching networks complete the power delivery system and provide fast and accurate tune-while-pulsing capability to keep pace with the rapid process steps in pulsed plasma applications. 

Yuval Wasserman, president of AE Thin Films, said, “Our comprehensive RF product suite enables the differentiated pulsing technology necessary for manufacturing 3DIC/FinFETs, V-NAND and MEMs. Korea has become an innovation center of excellence for these applications, and our distributed R&D model supports our customers’ activities with local development capability. AE offers not only unrivaled plasma management but an efficient business model with a design center in Seoul focused on lean engineering and operational excellence—allowing our design team to develop world-class RF power and match products at an accelerated time-to-market.”

In addition to the RF pulsing platform, Advanced Energy will display its other dynamic products for semiconductor and thin-film processing applications, including:

  • Optical fiber thermometers (OFTs), delivering precise multi-channel wafer temperature monitoring and control
  • Remote plasma sources for wafer processing, and point-of-use PFC abatement sources for low COO sustainability
  • DC and pulsed DC power supplies for reliable, cost-effective, custom film deposition for ceramic, metal and reactive PVD

At SEMICON Korea, co-located with LED Korea, Advanced Energy will also debut its MXE high-speed pyrometer—enabling accurate, repeatable measurement and control for demanding MOCVD applications. With up to a 10 kHz read rate, the MXE pyrometer is ideal for processes with high susceptor rotation speeds such as HB-LED growth. Precision temperature measurement, combined with 950 nm wavelength reflectance measurements, significantly enhances product yield.

SEMICON Korea takes place at the COEX Exhibition Center in Seoul, February 12 to 14. To learn more about Advanced Energy’s featured products, please visit the company in Hall A, booth 2612, and the company’s event website at

About Advanced Energy

Advanced Energy is a global leader in reliable power conversion solutions used in thin-film plasma manufacturing processes and solar energy generation. Founded in 1981, Advanced Energy is headquartered in Fort Collins, Colorado, with dedicated support and service locations around the world. For more information, go to